서브메뉴
검색
ECR플라즈마 工程에 의해 製造된 無定型 실리콘 薄膜과 실리콘 酸化薄膜의 特性 = Characteristics of the a-Si:H and SiO2 thin films prepared by ECR plasma processes
ECR플라즈마 工程에 의해 製造된 無定型 실리콘 薄膜과 실리콘 酸化薄膜의 特性 = Characteristics of the a-Si:H and SiO2 thin films prepared by ECR plasma processes
Detailed Information
- Material Type
- 학위논문
- Callnumber
- 570 전44ㅇ
- Author
- 전법주
- Title/Author
- ECR플라즈마 工程에 의해 製造된 無定型 실리콘 薄膜과 실리콘 酸化薄膜의 特性 = Characteristics of the a-Si:H and SiO2 thin films prepared by ECR plasma processes / 全法柱
- Publish Info
- 서울 : 檀國大學校 大學院, 1997.
- Material Info
- 250 p. ; 26 cm.
- 학위논문주기
- 학위논문(박사) - 檀國大學校 大學院 : 化學工學科 化學工學專攻, 1997
- Index Term-Uncontrolled
- ECR플라즈마 공정 의해 제조 무정형 실리콘 박막 산화 특성 ECR플라즈마 工程에 의해 製造된 無定型 실리콘 薄膜과 실리콘 酸化薄膜의 特性 Characteristics of the a-Si:H and SiO2 thin films prepared by ECR plasma processes
- Price Info
- 비매품
- Control Number
- kpcl:44197
MARC
008001101s1997 ulk AF 000a KOR■090 ▼a570▼b전44ㅇ
■1001 ▼a전법주
■24510▼aECR플라즈마 工程에 의해 製造된 無定型 실리콘 薄膜과 실리콘 酸化薄膜의 特性▼xCharacteristics of the a-Si:H and SiO2 thin films prepared by ECR plasma processes▼d全法柱
■260 ▼a서울▼b檀國大學校 大學院▼c1997.
■300 ▼a250 p.▼c26 cm.
■5021 ▼a학위논문(박사)▼b檀國大學校 大學院▼c化學工學科 化學工學專攻▼d1997
■653 ▼aECR플라즈마▼a공정▼a의해▼a제조▼a무정형▼a실리콘▼a박막▼a산화▼a특성▼aECR플라즈마 工程에 의해 製造된 無定型 실리콘 薄膜과 실리콘 酸化薄膜의 特性▼aCharacteristics of the a-Si:H and SiO2 thin films prepared by ECR plasma processes
■9501 ▼a비매품
Preview
Export
ChatGPT Discussion
AI Recommended Related Books
Detail Info.
- Reservation
- Not Exist
- Book Loan Request
- My Folder
| Reg No. | Call No. | Location | Status | Lend Info |
|---|---|---|---|---|
| AM000582 | TD 570 전44ㅇ '97 | 참고자료실 | 대출불가 |
대출불가 My Folder |
* Reservations are available in the borrowing book. To make reservations, Please click the reservation button
Books borrowed together with this book
Related books
Related Popular Books
Available after logging in.